D. Learning Tool
Although the research, development and manufacturing applications of lithography simulation presented above give ample benefits of modeling based on time, cost and capability, the underlying power of simulation is its ability to act as a learning tool. Proper application of modeling allows the user to learn efficiently and effectively. There are many reasons why this is true. First, the speed of simulation versus
experimentation makes feedback much more timely. Since learning is a cycle (an idea, an experiment, a measurement, then comparison back to the original idea), faster feedback allows for more cycles of learning.
Since simulation is very inexpensive, there are fewer inhibitions and more opportunities to explore ideas.
And, as the research application has shown us, there are fewer physical constraints on what “experiments”
can be performed. All of these factors allows the use of modeling to gain an understanding of lithography.
Whether learning fundamental concepts or exploring subtle nuances, the value of improved knowledge can not be overstated. In the sections that follow, the use of lithography simulation in manufacturing will be explored in much greater detail.
2. THE USE OF LITHOGRAPHY SIMULATION IN MANUFACTURING
A. Film Stack Optimization
Film stack optimization is the most frequent use of lithography simulation in a manufacturing environment for a number of reasons. First, film stacks frequently change in the fab and, other than the bottom antireflection coating (BARC) and resist, this film stack is not controlled by the photolithography
group. Thus, the lithography group must respond to these film stack changes with adjustments to the lithography process. From a lithography standpoint, the most important film stack property is the reflectivity of the substrate. Unfortunately, there is no way to measure the reflectivity of the substrate when coated with resist (substrate reflectivity in air has no meaning for this application). Thus, all BARC optimization efforts require the use of simulation. In turn, this simulation requires accurate measurement of BARC optical parameters (thickness, n, & k).
小弟论文中的一段 其他都翻译完了 这段实在不会了 求助大家
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只要是真正自己翻译的就可以 如果有专业术语不知道就把原英文放着就可以,只要用心翻译我一定会给分的,我不在乎分如果两个人都回答很好,我就再开贴送分!麻烦大家了!
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